Influence of Gamma Rays on Electrophysical Properties of Silicon Doped with Palladium Atoms
In this paper, we study the effect of gamma radiation (dose 107 rad) on the electrophysical properties of single crystals of n-type silicon (n-Si) doped with palladium atoms at different temperatures using the impedance spectroscopy method. It is determined that the electrical resistance of the original silicon will sharply increase several times as a result of irradiation due to the creation of radiation defects. In samples doped with Pd, γ-irradiation, on the contrary, reduces the resistance. This may be due to the destruction of existing traps, their transition to a neutral state or a shift in energy levels, reducing their activity. Using an electron microscope, the elemental composition was determined and micrographs were obtained on the surface of the original doped silicon samples.